Customization: | Available |
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CAS No.: | 75-46-7 |
Formula: | CHF3 |
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Product Name | Trifluoromethane |
Type | CHF3 |
Purity | n5.0 |
Cylinder Spec | 44L / 47L |
Fill contens (20?C) | 32kg / 32kg |
Fill pressure (20?C,-5%) | 41.8 bar |
Valve type | DISS 716 |
Applications | Semiconductor: Plasma etching gas, used in plasma dry etching process, low-temperature refrigerant. |