| Customization: | Available |
|---|---|
| CAS No.: | 7783-54-2 |
| Formula: | NF3 |
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| It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma etching gas in the microelectronics industry. It is the class 2.2 toxic gas, and its maximum allowable content in the air is 29mg/m3. Nitrogen trifluoride is an etchant and chamber cleaning agent. Product Specifications
Package type Company information: Suzhou Kaimei Electronic Material Co., Ltd is staffed by trained personnel, combine many years experience in Gas industry .We supply cylinder gas, electronic gas, etc ., and the gas holder, panel, valves and fittings and other equipment, parts and engineering services to our customers in China and worldwide; The products are involved in various industrial fields, such as semiconductor chip, solar cell, LED, TFT-LCD, optical fiber, glass, laser, medicine , etc., Our mission is to partner with our global customers to provide support, solutions and quality products that are innovative,reliable, and safe. Our products mainly include: H2, O2, N2, Ar, CO2, propane, acetylene, helium, laser mixed gas, SiH4, Sih2cl2, SiHCL3, SiCL4, NH3, CF4, NF3, SF6, HCL, N2O, doping mixed gas (TMB, PH3, B2H6) and other electronic gases.  |
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