Product Specifications:
Sulfur hexafluoride is used for plasma etching prior to chemical vapor deposition (CVD). Its uses include oxide etching, nitride etching, and wafer cleaning. Sulfur hexafluoride is also used in plasma chamber cleaning processes.
Specifications:
Product name |
Sulfur hexafluoride |
Type |
SF6 |
Purity |
n5.0 |
Cylinder Spec |
47L / 470L |
Fill contens (20?C) |
50kg / 500kg |
Fill pressure (20?C,-5%) |
23 bar |
Valve type |
DISS 716 |
Applications |
The semiconductor field is used in the chemical vapor deposition process,because of high resistance at high voltages, as an insulating agent for electrical equipment, leak detection gas,
and Sause spectrometer in the laboratory. |
Package type:
Company information:
Jiangsu Kaimei Electronic Material Co., Ltd is staffed by trained personnel, combine many years experience in Gas industry .We supply cylinder gas, electronic gas, etc ., and the gas holder, panel, valves and fittings and other equipment, parts and engineering services to our customers in China and worldwide; The products are involved in various industrial fields, such as semiconductor chip, solar cell, LED, TFT-LCD, optical fiber, glass, laser, medicine , etc., Our mission is to partner with our global customers to provide support, solutions and quality products that are innovative,reliable, and safe.
Our products mainly include: H2, O2, N2, Ar, CO2, propane, acetylene, helium, laser mixed gas, SiH4, Sih2cl2, SiHCL3, SiCL4, NH3, CF4, NF3, SF6, HCL, N2O, doping mixed gas (TMB, PH3, B2H6) and other electronic gases.